Patent 9985006 was granted and assigned to Taiwan Semiconductor Manufacturing Company on May, 2018 by the United States Patent and Trademark Office.
The present disclosure provides a method of manufacturing a structure. The method comprises: providing a substrate; forming an interconnect layer over the substrate; forming a plurality of conductive pads over the interconnect layer; forming conductive pillars over the interconnect layer; disposing a first semiconductor die over the conductive pads, the semiconductor die being spaced apart from the conductive pillars; and bonding a second semiconductor die with the conductive pillars.