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US Patent 9754767 RF pulse reflection reduction for processing substrates

Patent 9754767 was granted and assigned to Applied Materials on September, 2017 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Current Assignee
Applied Materials
Applied Materials
Date Filed
July 18, 2016
Date of Patent
September 5, 2017
Patent Applicant
Applied Materials
Applied Materials
Patent Application Number
15212879
Patent Citations Received
‌
US Patent 12125674 Surface charge and power feedback and control using a switch mode bias system
0
‌
US Patent 11887812 Bias supply with a single controlled switch
0
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US Patent 11942309 Bias supply with resonant switching
0
‌
US Patent 11978613 Transition control in a bias supply
0
‌
US Patent 11670487 Bias supply control and data processing
0
‌
US Patent 11682541 Radio frequency power supply system, plasma processor, and frequency-tuning matching
0
‌
US Patent 11842884 Spatial monitoring and control of plasma processing environments
0
Patent Inventor Names
Katsumasa Kawasaki
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9754767
Patent Primary Examiner
‌
Tung X Le

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