US Patent 9570343 Rinsing solution to prevent TiN pattern collapse

Patent 9570343 was granted and assigned to Avantor Performance Materials, Inc. on February, 2017 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors Activity

Is a

Patent

Patent attributes

Patent Applicant

Avantor Performance Materials, Inc.

Current Assignee

Avantor Performance Materials, Inc.

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

9570343

Date of Patent

February 14, 2017

Patent Application Number

14408431

Date Filed

June 21, 2013

Patent Citations Received

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US Patent 11935782 Methods for inhibiting line bending during conductive material deposition, and related apparatus

Patent Primary Examiner

Patent abstract

The present invention is a new formulation and process for treating TiN semiconductor devices having a high aspect ratio structure formed thereon. The new composition is designed to be used in the chip making process between cleaning a wet etched memory device and its final rinse/drying process. It is intended to include the treatment in order to prevent collapse of the high aspect ratio TiN structure found on the semiconductor device.