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US Patent 9399820 Electroless nickel plating bath

Patent 9399820 was granted and assigned to Atotech on July, 2016 by the United States Patent and Trademark Office.

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Patent
Patent

Patent attributes

Patent Applicant
Atotech
Atotech
Current Assignee
Atotech
Atotech
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9399820
Date of Patent
July 26, 2016
Patent Application Number
14368589
Date Filed
January 31, 2013
Patent Citations Received
‌
US Patent 11834746 Methods and systems for electroless plating a first metal onto a second metal in a molten salt bath, and surface pretreatments therefore
0
Patent Primary Examiner
‌
Helene Klemanski
Patent abstract

The present invention concerns an electroless nickel plating bath suitable for application in plating on plastic processes. The plating bath is free of hazardous substances such as lead ions and ammonia and allows deposition of nickel phosphorous alloys on plastic substrates at plating temperatures not higher than 55° C. Furthermore, the deposition of copper from an immersion type copper plating bath onto the nickel phosphorous coatings require no activation step which results in less process steps and less waste water production.

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