Patent attributes
A structured illumination microscopy optical arrangement includes a projection path and an imaging path. The imaging path includes an imaging sensor and imaging optical elements. The projection path includes a light generator, a pattern generating element such as a spatial light modulator (SLM), and projection optical elements including an output lens and a projector artifact suppression element (PASE) located in the projection path between the SLM and the output lens. The PASE may include birefringent material which splits respective light rays of the structured illumination pattern source light to provide at least one replication of the structured illumination pattern with an offset transverse to the projection path. The offset replication of the structured illumination pattern increases the accuracy of the system by reducing spatial harmonic errors and spurious intensity variations due to projector pixel gap artifacts which may otherwise produce errors in resulting Z-height measurements.