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US Patent 9009641 Circuits with linear finfet structures

Patent 9009641 was granted and assigned to Tela Innovations, Inc. on April, 2015 by the United States Patent and Trademark Office.

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Current Assignee
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Tela Innovations, Inc.
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9009641
Date of Patent
April 14, 2015
Patent Application Number
13740191
Date Filed
January 12, 2013
Patent Citations Received
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US Patent 11714949 Leakage analysis on semiconductor device
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US Patent 11862637 Tie off device
0
Patent Primary Examiner
Jack Chiang
Jack Chiang
Patent abstract

A first transistor has source and drain regions within a first diffusion fin. The first diffusion fin projects from a surface of a substrate. The first diffusion fin extends lengthwise in a first direction from a first end to a second end of the first diffusion fin. A second transistor has source and drain regions within a second diffusion fin. The second diffusion fin projects from the surface of the substrate. The second diffusion fin extends lengthwise in the first direction from a first end to a second end of the second diffusion fin. The second diffusion fin is positioned next to and spaced apart from the first diffusion fin. Either the first end or the second end of the second diffusion fin is positioned in the first direction between the first end and the second end of the first diffusion fin.

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