Patent attributes
A method of forming a gate dielectric in each MOTFT of an active matrix includes depositing a layer of gate metal on a substrate and patterning the gate metal to define a matrix of MOTFTs each including a gate electrode with all gate electrodes in each column connected together by a gate metal line and the line in each column connected at one end to the line in the next adjacent column by a gate metal bridging portion. The gate metal is anodized to form a layer of gate dielectric material. A layer of semiconductor metal oxide is deposited over the anodized gate metal and patterned to define an active layer for each MOTFT. Source/drain electrodes are formed on the layer of metal oxide for each MOTFT, and a laser is used to cut the bridging portion electrically connecting each gate metal line to the next adjacent gate metal line.
