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US Patent 8742511 Double gate planar field effect transistors

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Contents

Is a
Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
8742511
Patent Inventor Names
Josephine B. Chang0
Chung-Hsun Lin0
Jeffrey W. Sleight0
Leland Chang0
Date of Patent
June 3, 2014
Patent Application Number
13944480
Date Filed
July 17, 2013
Patent Citations Received
‌
US Patent 12136656 Semiconductor structure having two-dimensional channel
0
‌
US Patent 11935930 Wrap-around-contact for 2D-channel gate-all-around field-effect-transistors
0
Patent Primary Examiner
‌
Hoai V Pham
Patent abstract

A transistor device includes multiple planar layers of channel material connecting a source region and a drain region, where the planar layers are formed in a stack of layers of a channel material; and a gate conductor formed around and between the planar layers of channel material.

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