Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Lily Jiang0
Cindy Li0
Creek Zhu0
Junzhu Cao0
Date of Patent
March 25, 2014
0Patent Application Number
136864830
Date Filed
November 27, 2012
0Patent Primary Examiner
Patent abstract
A method for forming metal gates is provided. In the method, a substrate with a first region and a second region is provided. Dummy gate structures and an ILD layer is formed on the substrate. Dummy gates of the dummy gate structures are removed to form openings respectively within the two regions. Work function layers are respectively formed to overlay the openings. A metal layer is formed on the work function layers and then a CMP process is performed until the ILD layer is exposed, thereby forming the metal gates within the two regions at the same time. Only one CMP process is performed to the metal layer, so that over polishing of the ILD layer may be reduced and thickness of metal gates may be more accurately controlled.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
