US Patent 8623153 Method to prepare a stable transparent electrode

The present application discloses a method for producing a stable ultra thin metal film that comprises the following steps: a) deposition, on a substrate, of an ultra thin metal film, such as an ultra thin film of nickel, chromium, aluminum, or titanium; b) thermal treatment of the ultra thin metal film, optionally in combination with an O2 treatment; and c) obtaining a protective oxide layer on top of the ultra thin metal film.