Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Pankaj Singh0
Steven Grumbine0
Jeffrey Dysard0
Shoutian Li0
Date of Patent
August 28, 2012
0Patent Application Number
125843430
Date Filed
September 3, 2009
0Patent Citations Received
Patent Primary Examiner
Patent abstract
The invention provides a chemical-mechanical polishing composition for polishing a substrate. The polishing composition comprises silica, a compound selected from the group consisting of an amine-substituted silane, a tetraalkylammonium salt, a tetraalkylphosphonium salt, and an imidazolium salt, a carboxylic acid having seven or more carbon atoms, an oxidizing agent that oxidizes a metal, and water. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition.
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