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US Patent 8199321 Laser ablation apparatus and method

Patent 8199321 was granted and assigned to Applied Spectra, Inc on June, 2012 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Current Assignee
Applied Spectra, Inc
Applied Spectra, Inc
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
81993210
Patent Inventor Names
Jong Hyun Yoo0
Chunyi Liu0
Randolph S. Tribe0
Date of Patent
June 12, 2012
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Patent Application Number
124359700
Date Filed
May 5, 2009
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Patent Citations Received
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US Patent 11850677 Simultaneous pattern-scan placement during sample processing
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US Patent 11880018 Optical window with abrasion tolerance
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Patent Primary Examiner
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Layla Lauchman
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Patent abstract

Provided is a laser ablation spectroscopy apparatus and method. A pulse laser is focused on the sample site to generate a plasma plume during a laser ablation process. The plasma plume is detected with a spectrometer and an intensified charge coupled device. A sample of material is coupled to a stage movable in the x, y and z directions using an array of x-y-z motors. A change in the height of the sample is detected using a triangulation sensor. The apparatus includes a system computer for synchronizing the movement of the stage in the x, y and z direction during the laser ablation process. The method includes a protocol of generating one or more laser ablations per sample site. The spectral data of the total number of laser ablations for each sample site are averaged together. The protocol includes laser ablating additional sample sites and averaging the spectral data of the total number of sample sites.

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