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US Patent 8182127 Light source

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Patent abstractTimelineTable: Further ResourcesReferences
Is a
Patent
Patent
1

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
81821271
Patent Inventor Names
Yukio Yasuda1
Masaki Kato1
Taku Sumitomo1
Date of Patent
May 22, 2012
1
Patent Application Number
126460071
Date Filed
December 23, 2009
1
Patent Citations Received
‌
US Patent 11978620 Swirler for laser-sustained plasma light source with reverse vortex flow
2
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US Patent 11776804 Laser-sustained plasma light source with reverse vortex flow
‌
US Patent 11778720 High efficiency laser-sustained plasma light source with collection of broadband radiation
‌
US Patent 11844172 System and method for vacuum ultraviolet lamp assisted ignition of oxygen-containing laser sustained plasma sources
3
‌
US Patent 11887835 Laser-sustained plasma lamps with graded concentration of hydroxyl radical
4
Patent Primary Examiner
‌
Peggy A Neils
1
Patent abstract

A light source is provided. The light source includes: an elliptical reflection mirror having first and second focal points; a discharge chamber in which a luminescent substance is enclosed and which is disposed on the first focal point; a laser light generator which emits the laser light; and a laser light guide which guides the laser light from an opening side of the elliptical reflection mirror into the discharge chamber. The luminescent substance is excited by providing the laser light to the luminescent substance so as to emit light, and the light is reflected by the elliptical reflection mirror. The laser light guide is disposed in a shade area in which the light reflected by the elliptical reflection mirror is blocked by the discharge chamber.

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