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US Patent 8143790 Method for inductively-driven plasma light source

Patent 8143790 was granted and assigned to energetiq technology, inc. on March, 2012 by the United States Patent and Trademark Office.

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Patent
Patent
1

Patent attributes

Current Assignee
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energetiq technology, inc.
1
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
81437901
Patent Inventor Names
Paul A. Blackborow1
Donald K. Smith1
Matthew M. Besen1
Stephen F. Horne1
Date of Patent
March 27, 2012
1
Patent Application Number
119308561
Date Filed
October 31, 2007
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Patent Citations Received
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US Patent 11976642 Low pressure dielectric barrier discharge plasma thruster
2
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US Patent 11670484 Variable output impedance RF generator
3
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US Patent 11689107 Nanosecond pulser bias compensation
4
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US Patent 11875971 Efficient energy recovery in a nanosecond pulser circuit
5
Patent Primary Examiner
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Thuy Vinh Tran
1
Patent abstract

A method for producing light includes introducing an ionizable medium for generating a plasma into a chamber. The method also includes applying at least one pulse of energy to a magnetic core that surrounds a portion of a plasma discharge region within the chamber such that the magnetic core delivers power to the plasma which forms a secondary of a transformer according to Faraday's law of induction. The plasma has a localized high intensity zone.

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