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US Patent 8138098 Method of patterning stacked structure

Patent 8138098 was granted and assigned to Industrial Technology Research Institute on March, 2012 by the United States Patent and Trademark Office.

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Patent abstract

A stacked structure including a soluble organic semiconductor material and a water soluble photosensitive material is provided. The water soluble photosensitive material is disposed on the surface of the soluble organic semiconductor material.

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