Patent 7998528 was granted and assigned to Massachusetts Institute of Technology on August, 2011 by the United States Patent and Trademark Office.
An all-additive method for direct fabrication of nanometer-scale planar and multilayer structures comprises the steps of acquiring a transferable material with a submillimeter-scale tip, depositing at least a portion of the acquired first transferable material at a predetermined location onto a substrate without a bridging medium, and repeating to create a structure using the transferable material.