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Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Shoutian Li0
Date of Patent
August 16, 2011
Patent Application Number
11489054
Date Filed
July 19, 2006
Patent Primary Examiner
Patent abstract
A composition suitable for tantalum chemical-mechanical polishing (CMP) comprises about 0.1 to about 10 percent by weight of a zirconia or fumed alumina abrasive, about 0.1 to about 10 percent by weight of an alkali metal iodate salt and an aqueous carrier. The composition has a pH of at least about 10. The composition is utilized to polish a surface of a tantalum-containing substrate.
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