US Patent 7994066 Si surface cleaning for semiconductor circuits
Patent 7994066 was granted and assigned to Luxtera on August, 2011 by the United States Patent and Trademark Office.
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Patent abstract
A method is disclosed for the cleaning of a Si surface at low temperatures. Oxide on the Si surface is brought into contact with Ge, which then sublimates off the surface. The Ge contamination remaining after the oxide removal is cleared away by an exposure to an alkali halide. The disclosed cleaning method may by used in semiconductor circuit fabrication for preparing surfaces ahead of epitaxial growth.
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US Patent 07994066 Si surface cleaning for semiconductor circuits US Patent 7994066 Si surface cleaning for semiconductor circuits
Infobox
Patent Number
0799406600
Patent Number
799406600
Edits on 24 Apr, 2023
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079940660
Date of Patent
August 9, 2011
0Patent Application Number
118719870
Date Filed
October 13, 2007
0Patent Primary Examiner
Edits on 27 Sep, 2022
Golden AI
Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079940660
Date of Patent
August 9, 2011
0Patent Application Number
118719870
Date Filed
October 13, 2007
0Patent Primary Examiner
Edits on 8 Dec, 2021
Golden AI
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Infobox (+8 properties)
US Patent 07994066 Si surface cleaning for semiconductor circuits
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07994066
Date of patent
August 9, 2011
Patent application number
11871987
Date Filed
October 13, 2007
Patent primary examiner
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