Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jin Wuk Kim1
Yeon Heui Nam1
Date of Patent
August 2, 2011
1Patent Application Number
119808171
Date Filed
October 31, 2007
1Patent Primary Examiner
Patent abstract
A method for fabricating an LCD device is disclosed, in which a reliable thin film pattern is formed as process deviation is minimized. The method includes forming a thin film on a substrate; forming an etch resist solution on the thin film; applying a soft mold having a concave portion and a convex portion to the etch resist solution, wherein the convex portion includes a first width and a second width different than the first width; forming an etch resist pattern having a predetermined linewidth controlled by the pressure applied by the soft mold; hardening the etch resist pattern; separating the soft mold from the substrate; and patterning the thin film using the etch resist pattern as a mask.
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