Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 26, 2011
Patent Application Number
11427421
Date Filed
June 29, 2006
Patent Citations Received
Patent Primary Examiner
Patent abstract
A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; and a cleaning module adapted to clean the lithography apparatus. The cleaning module is selected from the group consisting of an ultrasonic unit, a scrubber, a fluid jet, an electrostatic cleaner, and combinations thereof.
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