US Patent 7971339 Method and apparatus for making a radio frequency inlay

Patent 7971339 was granted and assigned to HID Global on July, 2011 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

HID Global

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

79713390

Patent Inventor Names

David Finn0

Date of Patent

July 5, 2011

Patent Application Number

118601620

Date Filed

September 24, 2007

Patent Primary Examiner

‌

Minh Trinh

Patent abstract

A method and apparatus are provided for making radio frequency (RF) inlays. The RF inlays include an integrated circuit and an antenna affixed to a substrate material carrying the integrated circuit. During processing, portions of the wire forming the antenna are located adjacent to, but not directly over the integrated circuit. In the subsequent processing step, the wire ends are placed in contact with and secured to the integrated circuit terminal areas.