US Patent 7964107 Methods using block copolymer self-assembly for sub-lithographic patterning
Patent 7964107 was granted and assigned to Micron Technology on June, 2011 by the United States Patent and Trademark Office.
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Patent abstract
Block copolymers can be self-assembled and used in methods as described herein for sub-lithographic patterning, for example. The block copolymers can be diblock copolymers, triblock copolymers, multiblock copolymers, or combinations thereof. Such methods can be useful for making devices that include, for example, sub-lithographic conductive lines.
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Patent Inventor Names
Dan B. Millward0
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US Patent 07964107 Methods using block copolymer self-assembly for sub-lithographic patterning US Patent 7964107 Methods using block copolymer self-assembly for sub-lithographic patterning
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Patent Number
079641070
Patent Number
79641070
Edits on 31 Mar, 2023
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079641070
Date of Patent
June 21, 2011
0Patent Application Number
117039110
Date Filed
February 8, 2007
0Patent Primary Examiner
Edits on 8 Dec, 2021
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US Patent 07964107 Methods using block copolymer self-assembly for sub-lithographic patterning
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07964107
Date of patent
June 21, 2011
Patent application number
11703911
Date Filed
February 8, 2007
Patent primary examiner
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