Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Dan B. Millward1
Date of Patent
June 21, 2011
1Patent Application Number
117039111
Date Filed
February 8, 2007
1Patent Primary Examiner
Patent abstract
Block copolymers can be self-assembled and used in methods as described herein for sub-lithographic patterning, for example. The block copolymers can be diblock copolymers, triblock copolymers, multiblock copolymers, or combinations thereof. Such methods can be useful for making devices that include, for example, sub-lithographic conductive lines.
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