Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ta-Hung Yang0
Kuo-Liang Wei0
Ming-Tsung Wu0
Shih-Ping Hong0
An-Chi Wei0
Ching-Hsiung Li0
Han-Hui Hsu0
Date of Patent
June 14, 2011
Patent Application Number
12435336
Date Filed
May 4, 2009
Patent Primary Examiner
Patent abstract
A method of fabricating metal film stacks is described that reduces or eliminates adverse effects of photolithographic misalignments. A bottom critical dimension is increased by removal of a bottom titanium nitride barrier.
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