US Patent 7959746 Sputtering target material
All edits
Edits on 28 Nov, 2023
Golden AI
Edits made to:
Article (+228 characters)
Article
Patent abstract
This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.
Edits on 19 Sep, 2023
Golden AI
Edits made to:
Infobox (+2 properties)
Infobox
Patent Inventor Names
Koichi Hasegawa0
Nobuo Ishii0
Edits on 13 Jul, 2023
Golden AI
Edits made to:
Infobox (+1/-1 properties)
US Patent 07959746 Sputtering target material US Patent 7959746 Sputtering target material
Infobox
Patent Number
079597460
Patent Number
79597460
Edits on 22 Apr, 2023
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
079597460
Date of Patent
June 14, 2011
0Patent Application Number
105757250
Date Filed
October 8, 2004
0Patent Primary Examiner
Edits on 7 Dec, 2021
Golden AI
Edits made to:
Infobox (+7 properties)
US Patent 07959746 Sputtering target material
Infobox
Is a
Patent jurisdiction
Patent number
07959746
Date of patent
June 14, 2011
Patent application number
10575725
Date Filed
October 8, 2004
Patent primary examiner
Find more entities like US Patent 7959746 Sputtering target material
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
By using this site, you agree to our Terms of Service.