Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 17, 2011
Patent Application Number
12469973
Date Filed
May 21, 2009
Patent Primary Examiner
Patent abstract
Various processes and related systems are provided for making structures on substrate surfaces. Disclosed are methods of making a structure supported by a substrate by providing a substrate having a receiving surface and exposing at least a portion of the receiving surface to output from a remote plasma of an inert gas. The remote plasma has an energy low enough to substantially avoid etching or sputtering of the receiving surface but sufficient to generate a treated receiving surface. The treated surface is contacted with a deposition gas, thereby making the structure supported by the substrate.
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