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US Patent 7943007 Configurable bevel etcher

Patent 7943007 was granted and assigned to Lam Research on May, 2011 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Current Assignee
Lam Research
Lam Research
Date Filed
January 26, 2007
Date of Patent
May 17, 2011
Patent Application Number
11698190
Patent Citations Received
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US Patent 11946142 Spatially tunable deposition to compensate within wafer differential bow
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US Patent 11756771 Tunable upper plasma-exclusion-zone ring for a bevel etcher
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US Patent 11791137 Apparatus for etching substrate bevel and semiconductor fabrication method using the same
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US Patent 11851760 PECVD deposition system for deposition on selective side of the substrate
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Patent Inventor Names
Alan M. Schoepp
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Andrew D. Bailey, III
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Gregory Sexton
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William S. Kennedy
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Yunsang Kim
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7943007
Patent Primary Examiner
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Ram N Kackar

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