US Patent 7942111 Method and device for vacuum-coating a substrate
Patent 7942111 was granted and assigned to Bosch (company) on May, 2011 by the United States Patent and Trademark Office.
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Patent abstract
A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.
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US Patent 07942111 Method and device for vacuum-coating a substrate US Patent 7942111 Method and device for vacuum-coating a substrate
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Patent Number
0794211100
Patent Number
794211100
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Katrina-Kay Pettitt
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079421110
Date of Patent
May 17, 2011
0Patent Application Number
110084130
Date Filed
December 9, 2004
0Patent Primary Examiner
Edits on 28 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079421110
Date of Patent
May 17, 2011
0Patent Application Number
110084130
Date Filed
December 9, 2004
0Patent Primary Examiner
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US Patent 07942111 Method and device for vacuum-coating a substrate
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07942111
Date of patent
May 17, 2011
Patent application number
11008413
Date Filed
December 9, 2004
Patent primary examiner
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