Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 3, 2011
Patent Application Number
12028847
Date Filed
February 11, 2008
Patent Primary Examiner
Patent abstract
A method of forming a small geometry feature. The method includes forming a source layer on a top surface of a substrate; forming a mandrel on a top surface of the source layer, the mandrel having a sidewall; sputtering material from the source layer onto the sidewall of the mandrel to form a sidewall layer on the sidewall of the mandrel; and removing the mandrel. Also methods to forming wires and field effect transistors of integrated circuits.
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