Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 5, 2011
Patent Application Number
12273546
Date Filed
November 19, 2008
Patent Primary Examiner
Patent abstract
A method for forming a semiconductor chip or wafer includes following steps. A semiconductor substrate is provided, and then a polymer layer is deposited over the semiconductor substrate, wherein the polymer layer comprises polyimide. The polymer layer with a temperature profile having a peak temperature between 200 and 320 degrees Celsius. Alternatively, the temperature profile may comprises a period of time with a temperature higher than 320 degree Celsius, wherein the period of time is shorter than 45 minutes.
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