Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Saurabh Dutta Chowdhury0
Helena Stadniychuk0
Date of Patent
March 29, 2011
Patent Application Number
11169152
Date Filed
June 27, 2005
Patent Primary Examiner
Patent abstract
A method of forming a semiconductor structure comprises etching an anti-reflective coating on a substrate with a first plasma comprising bromine and oxygen; and etching a nitride layer on the substrate with a second plasma comprising bromine and oxygen.
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