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US Patent 7910886 Sample dimension measuring method and scanning electron microscope

Patent 7910886 was granted and assigned to Hitachi on March, 2011 by the United States Patent and Trademark Office.

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Patent
Patent

Patent attributes

Current Assignee
Hitachi
Hitachi
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7910886
Patent Inventor Names
Takashi Iizumi1
Hiroki Kawada1
Tadashi Otaka1
Date of Patent
March 22, 2011
Patent Application Number
11902088
Date Filed
September 19, 2007
Patent Primary Examiner
‌
Bernard E Souw
Patent abstract

An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern. To accomplish this object, according to the invention, functions indicative of a process of change of pattern dimension when the electron beam is irradiated on a sample are prepared in respect of the kinds of sample patterns, and dimension values of a particular pattern measured by scanning the electron beam on the particular pattern are fitted to a function prepared for the particular pattern to calculate a dimension of the particular pattern before it changes.

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