Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 22, 2011
Patent Application Number
12355401
Date Filed
January 16, 2009
Patent Primary Examiner
Patent abstract
A method for fabricating a semiconductor device with improved performance is disclosed. The method comprises providing a semiconductor substrate; forming one or more gate stacks having an interfacial layer, a high-k dielectric layer, and a gate layer over the substrate; and performing at least one treatment on the interfacial layer, wherein the treatment comprises a microwave radiation treatment, an ultraviolet radiation treatment, or a combination thereof.
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