Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
February 22, 2011
Patent Application Number
12632424
Date Filed
December 7, 2009
Patent Citations Received
Patent Primary Examiner
Patent abstract
An image sensor includes a trench formed by a shallow trench isolation (STI) process, a channel stop layer formed over a substrate in the trench, an isolation structure filled in the trench, and a photodiode formed in the substrate adjacent to a sidewall of the trench. In more detail of the image sensor, a trench is formed in a substrate through a STI process, and a channel stop layer is formed over the substrate in the trench. An isolation structure is formed in the trench, and a photodiode is formed in the substrate adjacent to a sidewall of the trench.
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