Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yu-Lan Chang0
Tsai-Fu Hsiao0
Tsung-Yu Hung0
Yi-Wei Chen0
Chao-Ching Hsieh0
Chun-Chieh Chang0
Date of Patent
February 22, 2011
Patent Application Number
11564850
Date Filed
November 30, 2006
Patent Primary Examiner
Patent abstract
A semiconductor process is provided. The semiconductor process includes providing a substrate. Then, a surface treatment is performed to the substrate to form a buffer layer on the substrate. Next, a first pre-amorphous implantation is performed to the substrate.
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