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US Patent 7884411 Area-efficient gated diode structure and method of forming same

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Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7884411
Patent Inventor Names
Wing Kin Luk1
David M. Fried1
Leland Chang1
Robert H. Dennard1
Date of Patent
February 8, 2011
Patent Application Number
12051116
Date Filed
March 19, 2008
Patent Primary Examiner
‌
Chuong A Luu
Patent abstract

An area-efficient gated diode includes a semiconductor layer of a first conductivity type, an active region of a second conductivity type formed in the semiconductor layer proximate an upper surface thereof, and at least one trench electrode extending vertically through the active region and at least partially into the semiconductor layer. A first terminal of the gated diode is connected to the trench electrode, and a second terminal is connected to the active region. The gated diode is operative in one of at least first an second modes as a function of a voltage potential applied between the first and second terminals. The first mode is characterized by the creation of an inversion layer in the semiconductor layer surrounding the trench electrode. The gated diode has a first capacitance in the first mode and a second capacitance in the second mode, the first capacitance being greater than the second capacitance.

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