Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
February 8, 2011
Patent Application Number
11589979
Date Filed
October 31, 2006
Patent Primary Examiner
Patent abstract
A method of manufacturing a semiconductor device includes subjecting a semiconductor substrate having an aluminum film formed thereabove to a processing to at least partially expose a surface of the aluminum film, and carrying out a surface processing to remove an after-processing residue that remains on the exposed surface of the aluminum film. The surface processing includes treating the exposed surface of the aluminum film with a first liquid chemical containing an anion component and then with an alkaline, second liquid chemical.
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