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US Patent 7880897 Light wave interferometer apparatus

Patent 7880897 was granted and assigned to Fujinon on February, 2011 by the United States Patent and Trademark Office.

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Patent
Patent

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Current Assignee
‌
Fujinon
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7880897
Date of Patent
February 1, 2011
Patent Application Number
12334034
Date Filed
December 12, 2008
Patent Primary Examiner
‌
Patrick J Connolly
Patent abstract

The light wave interferometer apparatus is provided and includes: a luminous flux, which is sent from the light source and divided into two portions by the luminous flux separation and composition unit, are combined with each other again under the condition that the divided luminous fluxes hold wavefront information corresponding to the surface shapes of the aspherical lens to be inspected and the reference aspherical lens by the respectively corresponding basis spherical lenses. Therefore, a wavefront difference of the aspherical lens to be inspected with respect to the reference aspherical lens is made to be interference fringe information and formed on an image pickup plane of the interferometer CCD camera. The basis spherical lenses have the basis spherical surfaces, the curvatures of which are equal to each other.

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