US Patent 7880859 Substrate processing system and substrate processing method
Patent 7880859 was granted and assigned to Tokyo Electron on February, 2011 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
November 18, 2009
0
Date of Patent
February 1, 2011
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Patent Application Number
12621252
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Patent Inventor Names
Yoshitaka Hara
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Shinichi Hayashi
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Yasushi Hayashida
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Patent Jurisdiction
Patent Number
Patent Primary Examiner
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