US Patent 7875851 Advanced process control framework using two-dimensional image analysis
Patent 7875851 was granted and assigned to Advanced Micro Devices on January, 2011 by the United States Patent and Trademark Office.
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The claimed subject matter provides a system and/or a method that facilitates utilizing a resolution enhancement for a circuit feature. A scanning electron microscope component (104, 204, 304, 404) can provide at least one two-dimensional image of the circuit feature. An image analysis engine (106, 206, 306, 406) can analyze the two-dimensional image. An advanced process control (APC) engine (108, 208, 308, 408) can generate at least one instruction for at least one of a feed forward control and a feedback control and a process component (102, 202, 302, 402) can utilize the at least one instruction to minimize an error.
US Patent 07875851 Advanced process control framework using two-dimensional image analysis US Patent 7875851 Advanced process control framework using two-dimensional image analysis
US Patent 07875851 Advanced process control framework using two-dimensional image analysis
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