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US Patent 7875196 Method for forming micro lenses

Patent 7875196 was granted and assigned to Tokyo Electron on January, 2011 by the United States Patent and Trademark Office.

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Patent
Patent
1

Patent attributes

Current Assignee
Tokyo Electron
Tokyo Electron
1
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
78751961
Patent Inventor Names
Hiroki Amemiya1
Date of Patent
January 25, 2011
1
Patent Application Number
125125241
Date Filed
July 30, 2009
1
Patent Primary Examiner
‌
Allan Olsen
1
Patent abstract

A method for forming micro lenses includes the step of performing an etching treatment to an object to be processed, which includes a lens material layer and a mask layer having lens shapes and formed on the lens material layer, using an etching gas including SF6 gas and CHF3 gas, an etching gas including SF6 gas and CO gas, an etching gas including a gas having therein carbon and fluorine and CO gas, or an etching gas including two or more kinds of gases from a first gas having therein carbon and fluorine and a second gas having therein carbon and fluorine, to etch the lens material layer and the mask layer and transfer the lens shapes of the mask layer to the lens material layer, thereby forming the micro lenses.

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