Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Robin Charis Scott0
Matt Johnson0
Date of Patent
January 18, 2011
Patent Application Number
12331322
Date Filed
December 9, 2008
Patent Primary Examiner
Patent abstract
Methods and systems are provided for low pressure baking to remove impurities from a semiconductor surface prior to deposition. Advantageously, the short, low temperature processes consume only a small portion of the thermal budget, while still proving effective at removing interfacial oxygen from the semiconductor surface. The methods and systems are particularly well suited for treating semiconductor surfaces before epitaxy.
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