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US Patent 7867366 Coaxial plasma arc vapor deposition apparatus and method

Patent 7867366 was granted and assigned to Alameda Applied Sciences Corporation on January, 2011 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Current Assignee
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Alameda Applied Sciences Corporation
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
78673660
Patent Inventor Names
Jason D. Wright0
Michael D. McFarland0
Andrew N. Gerhan0
Benjamin Tang0
Mahadevan Krishnan0
Date of Patent
January 11, 2011
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Patent Application Number
108345920
Date Filed
April 28, 2004
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Patent Citations Received
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US Patent 11684546 PECVD coated pharmaceutical packaging
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US Patent 11884446 Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
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Patent Primary Examiner
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Alexa D. Neckel
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Patent abstract

An apparatus for the deposition of a variable thickness coating onto the inside of a cylindrical tube comprises a variable pressure gas, an cathode coaxially positioned within the cylinder, and a voltage source applied between the cathode and cylindrical tube, which functions as an anode. A radial plasma arc is generated between the anode and cathode at a starting point on the cylinder, and the plasma arc travels down the central axis of the cylinder, providing a helical deposition region on the inside of the cylinder. Selection of the combination of cathode material and gas enable the plasma to generate ionic material which is deposited on the anodic cylinder in the region of the plasma. By varying the pressure of variable pressure gas for each helical path, it is possible to vary the composition of this deposition film.

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