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US Patent 7860597 Atomic layer deposition apparatus

Patent 7860597 was granted and assigned to Applied Materials on December, 2010 by the United States Patent and Trademark Office.

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Patent abstract

A method and apparatus for atomic layer deposition (ALD) is described. The apparatus comprises a deposition chamber and a wafer support. The deposition chamber is divided into two or more deposition regions that are integrally connected one to another. The wafer support is movable between the two or more interconnected deposition regions within the deposition chamber.

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Patent Inventor Names
Alfred W. Mak0
Barry L. Chin0
Hua Chung0
Jeong Soo Byun0
Ken Kaung Lai0
Lawrence Chung-Lai Lei0
Ming Xi0
Edits on 23 May, 2023
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=078605970
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US Patent 07860597 Atomic layer deposition apparatus US Patent 7860597 Atomic layer deposition apparatus

Infobox
Patent Number
078605970
Patent Number
78605970
Edits on 25 Sep, 2022
"Entity importer update"
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edited on 25 Sep, 2022
Infobox
Is a
Patent
Patent
0
Current Assignee
Applied Materials
Applied Materials
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
078605970
Date of Patent
December 28, 2010
0
Patent Application Number
126467060
Date Filed
December 23, 2009
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=078605970
Patent Primary Examiner
‌
Michael D Masinick
0
Edits on 4 Jun, 2022
"Entity importer update"
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edited on 4 Jun, 2022
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Infobox
Website URL
https://pdfpiw.uspto.gov/.piw?Docid=07860597
Edits on 6 Dec, 2021
"Created via: Entity Importer"
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created this topic on 6 Dec, 2021
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 US Patent 07860597 Atomic layer deposition apparatus

Infobox
Is a
Patent
Patent
Current assignee
Applied Materials
Applied Materials
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
07860597
Date of patent
December 28, 2010
Patent application number
12646706
Date Filed
December 23, 2009
Patent primary examiner
‌
Michael D Masinick

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