Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tsai-Sheng Gau0
Chih-Ming Ke0
Te-Chih Huang0
Date of Patent
December 28, 2010
0Patent Application Number
116860780
Date Filed
March 14, 2007
0Patent Primary Examiner
Patent abstract
A method of semiconductor manufacturing including forming an overlay offset measurement target including a first feature on a first layer and a second feature on a second layer. The first feature and the second feature have a first predetermined overlay offset. The target is irradiated. The reflectivity of the irradiated target is determined. An overlay offset for the first layer and the second layer is calculated using the determined reflectivity.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
