Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Eric M. Lee0
Junjun Liu0
Dorel I. Toma0
Date of Patent
December 21, 2010
Patent Application Number
12415022
Date Filed
March 31, 2009
Patent Primary Examiner
Patent abstract
A method for forming an air gap structure on a substrate is described. The method comprises depositing a sacrificial layer on a substrate, forming an adhesion-promoting layer between the sacrificial layer and the substrate, and depositing a capping layer over the sacrificial layer. The sacrificial layer and the capping layer are patterned and metalized. Thereafter, the sacrificial layer is decomposed and removed through the capping layer.
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