Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jeffrey M. Dysard0
Paul M. Feeney0
Sriram Anjur0
Date of Patent
November 23, 2010
0Patent Application Number
115991990
Date Filed
November 13, 2006
0Patent Primary Examiner
Patent abstract
The invention provides a method of chemically-mechanically polishing a substrate having at least one feature defined thereon, wherein the feature has at least one dimension with a size W, with a chemical-mechanical polishing composition. The polishing composition comprises particles of an abrasive wherein the particles have a mean particle diameter DM wherein the mean particle diameter of the particles satisfies the equation: DM>W. The invention further provides a method of preparing the chemical-mechanical polishing composition.
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