Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Toshiaki Fukuyama0
Kenji Wada0
Ryotatsu Otsuka0
Date of Patent
October 12, 2010
0Patent Application Number
116312870
Date Filed
July 4, 2005
0Patent Primary Examiner
Patent abstract
The disclosure is directed to a method for purifying metals, which can very efficiently and inexpensively eliminate impurity elements included in various metallic or semiconductor materials, or more specifically included in metallurgical grade silicon.
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