US Patent 7795361 Photoreactive polymer and process of making the same
Patent 7795361 was granted and assigned to LG Chem on September, 2010 by the United States Patent and Trademark Office.
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Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.
US Patent 07795361 Photoreactive polymer and process of making the same US Patent 7795361 Photoreactive polymer and process of making the same
US Patent 07795361 Photoreactive polymer and process of making the same
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