US Patent 7794829 Reflector having high light diffusion
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Patent abstract
The invention pertains to a reflector comprising a substrate capable of reflecting light, characterized in that the reflector exhibits a gloss of less than 10% as determined when a light source is projected on the surface of the reflector at 60 degree.
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Patent Inventor Names
Chia-Yi Lu0
Lung-Lin Hsu0
Tu-Yi Wu0
Yung-Ming She0
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US Patent 07794829 Reflector having high light diffusion US Patent 7794829 Reflector having high light diffusion
Infobox
Patent Number
077948290
Patent Number
77948290
Edits on 29 Apr, 2023
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Patent Jurisdiction
Patent Number
077948290
Date of Patent
September 14, 2010
0Patent Application Number
115134720
Date Filed
August 31, 2006
0Official Website
Patent Primary Examiner
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US Patent 07794829 Reflector having high light diffusion
Infobox
Is a
Patent jurisdiction
Patent number
07794829
Date of patent
September 14, 2010
Patent application number
11513472
Date Filed
August 31, 2006
Patent primary examiner
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