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US Patent 7793253 Mask-patterns including intentional breaks

Patent 7793253 was granted and assigned to LUMINESCENT TECHNOLOGIES, INC. on September, 2010 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

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LUMINESCENT TECHNOLOGIES, INC.

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7793253

Date of Patent

September 7, 2010

Patent Application Number

11538782

Date Filed

October 4, 2006

Patent Primary Examiner

Jack Chiang

Patent abstract

A method for determining a mask pattern to be used on a photo-mask in a photolithographic process is described. During the method, a target pattern that includes at least one continuous feature is provided. Then a mask pattern that includes a plurality of distinct types of regions corresponding to the distinct types of regions of the photo-mask is determined. Note that the mask pattern includes at least two separate features corresponding to at least the one continuous feature. Furthermore, at least the two separate features are separated by a spacing having a length and the spacing overlaps at least a portion of at least the one continuous feature.